{"id":1287,"date":"2026-10-16T09:11:50","date_gmt":"2026-10-16T01:11:50","guid":{"rendered":"http:\/\/nowa1008.web.site808.cn\/?post_type=support&#038;p=1287"},"modified":"2026-10-16T09:15:17","modified_gmt":"2026-10-16T01:15:17","slug":"common-plasma-cleaning-defects-and-solutions","status":"publish","type":"support","link":"https:\/\/www.nowasemi.com\/zh\/support\/common-plasma-cleaning-defects-and-solutions\/","title":{"rendered":"Common Plasma Cleaning Defects and Solutions"},"content":{"rendered":"<h2>Common Plasma Cleaning Defects and Solutions<\/h2>\n<p>Under-cleaning, over-etching, poor uniformity, redeposition, and surface damage usually point to an unstable recipe, chamber condition, loading pattern, or material mismatch.<\/p>\n<h3 class=\"mt30\">\u5173\u952e\u8003\u8651\u56e0\u7d20<\/h3>\n<ul>\n<li>\u5728\u52a0\u5de5\u524d\u786e\u8ba4\u6750\u6599\u517c\u5bb9\u6027\u3001\u8bbe\u5907\u72b6\u51b5\u548c\u9a8c\u6536\u6807\u51c6\u3002.<\/li>\n<li>\u63a7\u5236\u5173\u952e\u53c2\u6570\uff0c\u5e76\u8bb0\u5f55\u6bcf\u6279\u5408\u683c\u4ea7\u54c1\u6216\u751f\u4ea7\u6279\u6b21\u7684\u53ef\u8ffd\u6eaf\u6570\u636e\u3002.<\/li>\n<li>\u5229\u7528\u68c0\u6d4b\u548c\u6027\u80fd\u7ed3\u679c\uff0c\u533a\u5206\u6b63\u5e38\u53d8\u5316\u4e0e\u6b63\u5728\u53d1\u751f\u7684\u5de5\u827a\u95ee\u9898\u3002.<\/li>\n<\/ul>\n<h3 class=\"mt30\">\u63a8\u8350\u7684\u65b9\u6cd5<\/h3>\n<p>\u4ece\u5df2\u8bb0\u5f55\u7684\u57fa\u7840\u6570\u636e\u5f00\u59cb\uff0c\u5e76\u4e00\u6b21\u6027\u6539\u53d8\u4e00\u4e2a\u660e\u786e\u7684\u56e0\u7d20\u3002\u8fd0\u884c\u4ee3\u8868\u6027\u6837\u672c\uff0c\u4e0e\u534f\u8bae\u89c4\u8303\u8fdb\u884c\u5bf9\u6bd4\uff0c\u5e76\u9a8c\u8bc1\u6539\u8fdb\u7ed3\u679c\u662f\u5426\u5728\u4e0d\u540c\u5730\u70b9\u3001\u64cd\u4f5c\u5458\u548c\u7269\u6599\u6279\u6b21\u4e2d\u4fdd\u6301\u7a33\u5b9a\u3002\u9884\u9632\u6027\u7ef4\u62a4\u548c\u5b9a\u671f\u6821\u51c6\u5e94\u8be5\u652f\u6301\u8fd9\u4e00\u8fc7\u7a0b\uff0c\u800c\u4e0d\u662f\u5f25\u8865\u4e0d\u7a33\u5b9a\u914d\u65b9\u7684\u4e0d\u8db3\u3002.<\/p>\n<h3 class=\"mt30\">\u7ed3\u8bba<\/h3>\n<p>Common Plasma Cleaning Defects and Solutions should be managed through clear specifications, controlled trials, and ongoing trend review. This approach improves repeatability, supports faster troubleshooting, and reduces the risk of hidden reliability issues in semiconductor manufacturing.<\/p>","protected":false},"featured_media":0,"template":"","meta":{"_acf_changed":false},"support_cat":[70],"class_list":["post-1287","support","type-support","status-publish","hentry","support_cat-plasma-cleaning-principles"],"acf":[],"_links":{"self":[{"href":"https:\/\/www.nowasemi.com\/zh\/wp-json\/wp\/v2\/support\/1287","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.nowasemi.com\/zh\/wp-json\/wp\/v2\/support"}],"about":[{"href":"https:\/\/www.nowasemi.com\/zh\/wp-json\/wp\/v2\/types\/support"}],"wp:attachment":[{"href":"https:\/\/www.nowasemi.com\/zh\/wp-json\/wp\/v2\/media?parent=1287"}],"wp:term":[{"taxonomy":"support_cat","embeddable":true,"href":"https:\/\/www.nowasemi.com\/zh\/wp-json\/wp\/v2\/support_cat?post=1287"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}