Bantuan teknikal

Optimizing Plasma Treatment Uniformity

Uniform treatment depends on electric-field distribution, gas flow, part spacing, chamber loading, and fixture design. Mapping results across the work area reveals local weak zones before production release.

Learn more →

Ingin mencari bahagian, peralatan atau penyelesaian kejuruteraan?

Beritahu kami model peralatan anda, nombor bahagian atau keperluan proses. Jurutera kami
Pasukan kami akan membantu anda mencari penyelesaian yang tepat.

Hakcipta © 2026 Suzhou NOWA Semiconductor Co., Ltd. Hak cipta terpelihara.